Arbeitskreis Modellierung von Systemen und
Parameterextraktion Modeling of Systems and Parameter Extraction Working Group MOS-AK Workshop at ESSDERC/ESSCIRC Dresden, Sept. 3 2018 |
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MOS-AK Workshop
Program |
Important Dates: |
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Venue: |
Technische
Universität Dresden
room CHE/0184/U Dresden (D) |
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Agenda |
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9:00-12:30 |
MOS-AK Morning Session I - Chair: Larry Nagel, OEC (USA) |
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T_0 | MOS-AK Overview W. Grabinski, Larry Nagel MOS-AK (EU), OEC (USA) |
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T_1 | Physically Compliant CMOS Electronics
Enabled
Interactive Electronic System Muhammad Mustafa Hussain KAUST (SA) |
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T_2 | RF CMOS Compact modelling technologies
past and
future Sadayuki Yoshitomi TOSHIBA Memory Corporation (J) |
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10:00-10:30 |
Coffee Break |
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10:30-12:30 |
MOS-AK Morning Session II - Chair: Suba Subramaniam, XFAB (D) |
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T_3 | Analysis and modelling of wafer level
process
variability in advanced FD-SOI devices using split C-V and gate
current data Krishna Pradeep1,2, T. A. Karatsori2, T. Poiroux3, A. Juge1, P. Scheer1, G. Gouget1, and G. Ghibaudo2 1) STMicroelectronics, Crolles Site, 850 rue Jean Monnet, 38926 Crolles, France |
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T_4 | Equivalent Correlation between Short Channel DG & GAA
MOSFETs Kerim Yılmaz, Ghader Darbandy, Benjamín Iñíguez, François Lime and Alexander Kloes THM (D), URV (SP) |
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T_5 | Compact Modeling For Neuromorphic
Applications L.E. Calvet*, C. Bennett*, D. Querlioz*, T. Krauss**, U. Schwalke**, A. Kloes*** and M. Schwarz*** * Center for Nanoscience and Nanotechnology, Universit Paris-Sud, France. ** TU Darmstadt, Germany. *** NanoP, Technische Hochschule Mittelhessen, Germany. |
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T_6 | Advanced PDK and Technologies accessible
through
ASCENT” Luca Perniola, Paul Roseingrave CEA (F) Tyndall (IR) |
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12:30-14:00 |
Lunch Break |
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14:00-16:00 |
MOS-AK Afternoon Session - Chair: Matthias Bucher, TUC (GR) |
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T_7 | Reliability Modeling in Harsh Radiation
for
Space Applications Farzan Jazaeri, Christian Enz ICLab, EPFL (CH) |
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T_8 | Low frequency noise modeling of organic
and IGZO
TFTs. Benjamin Iñiguez*, Gerard Uriarte*, Wondwosen E. Muhea* and Thoms Gneiting** *Universitat Rovira i Virgili, Tarragona, Spain, **AdMOS GmBH, Germany |
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T_9 | Schottky Barrier Mosfet Device Physics For
Cryogenic Applications M. Schwarz*, L. E. Calvet**, J. P. Snyder***, T. Krauss****, U. Schwalke****, and A. Kloes* * NanoP, Technische Hochschule Mittelhessen, Germany. ** Center for Nanoscience and Nanotechnology, Universit Paris-Sud, France. *** JCap, LLC, USA. **** TU Darmstadt, Germany. |
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T_10 | Compact Modeling for Process and Device
Characterization Daniel Tomaszewski* and Wladek Grabinski** *ITE (PL), **GMC (CH) |
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16:00-16:30 |
Coffee Break |
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16:30 |
End of the MOS-AK workshop |
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Extended MOS-AK Committee: | ||||||
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